Coherent Fourier Scatterometry for the fast and sensitive detection of subwavelength structures and particles
We investigate and optimize new techniques to detect nanostructures and nano-particles in semiconductor, and plastic-based fabrication technologies. The technique should be fast, operate in-line and applicable to large areas. Since the structures are too small to be imaged, a technique called scatterometry is implemented.
We propose to boost the sensitivity of nanoparticle detection using Coherent Fourier scatterometry by optimizing the illumination mode in conjunction with optimized detection schemes. With currently available spatial light modulators and deformable mirrors, the amplitude, phase and polarisation of the optimum optical fields can be shaped to achieve a focused field that will give maximum sensitivity for particle detection. Furthermore, we will optimize the detection system to retrieve the essential information at high speed and to suppress the influence of the noise in the system maximally. Finally, since in many applications it is important to probe larger areas up to a few square centimetres in a few minutes, we work on designing a parallelized version of the nanoparticle detector.