Understanding the size-dependent properties of various material ultra-thin films for integrated circuits is critical for nanotechnology innovation. Photonic measurement methods in the soft-X ray to IR wavelength range that approach theoretical limits require improved traceability coupled with rigorous uncertainty estimations to provide the tools needed to characterize novel optical materials. To increase the applicability of a particular technique, mathematical and numerical modeling approaches must be improved.
This project receives funding from EMPIR JRP 20IND04 ”ATMOC”.
The goal is to develop efficient, reliable forward modeling of coherent Fourier scatterometry and to calculate reliable uncertainties for various materials and geometries chosen as test multilayer samples at the technique’s operational wavelength. We will adapt and develop numerical models to suit future measurement data analysis for this purpose. We will deal with extended modeling, which includes perturbations caused by imperfections such as roughness and statistical measurement errors found in real measurements. Using the forward models, error models, and the full uncertainty budget, we will conduct virtual experiments with the various measurement setups and test samples that will be used in this project. The data analysis software will be made available to the general public as an open source collection of software tools and scripts.
The immediate impact of developing coherent Fourier scatterometry towards application in determining thin/thick layer properties is in progressing metrology science related to spectroscopic ellipsometry and scatterometry methods. This research has a broader impact in the nanotechnology domain, with applications in industries such as information and communications, food technology, energy technology, medical products and medicines, as well as the reduction of environmental pollution.