Extreme UV and Soft X-Ray metrology

Project

Continuous progress in the semi-conductor industry are leading to smaller, faster and more energy efficient chips for our modern society. Critical parameters for this industry, such as overlay and critical dimension (CD), can go down to a few nanometers. To follow this trend, there is a need for high-resolution metrology in order to inspect these small structures. Short wavelength metrology in the Extreme UV (EUV) and Soft X-Ray (SXR) regime can help us to get there.

The Optics Research Group performs research on various metrology methods using these short wavelengths, with the main focus on lensless imaging. With a high-flux high harmonic generation source to our disposal we are able to inspect high-end semiconductor chips using methods like ptychography.


Objective


Impact


Keywords
Target Groups


Semiconductor Industry, Surface and Material Analyse Industry

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News.

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SLIM funding for TUD, The Hague University of Applied Sciences, LIS and TNO for the Bedrijfsschool Optica

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News - October 15, 2020

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